To enhance security and protect against terrorist attacks at chemical facilities.
The bill’s titles are written by its sponsor.
Mar 16, 2006
109th Congress, 2005–2006
Died in a previous Congress
This bill was introduced on March 16, 2006, in a previous session of Congress, but was not enacted.
Representative for Connecticut's 4th congressional district
Read Text »
Last Updated: Mar 16, 2006
Length: 65 pages
- See Instead:
S. 2145 (same title)
Ordered Reported — Jun 15, 2006
H.R. 5695 (same title)
Ordered Reported — Jul 27, 2006
Mar 16, 2006
Bills and resolutions are referred to committees which debate the bill before possibly sending it on to the whole chamber.
H.R. 4999 (109th) was a bill in the United States Congress.
A bill must be passed by both the House and Senate in identical form and then be signed by the President to become law.
This bill was introduced in the 109th Congress, which met from Jan 4, 2005 to Dec 9, 2006. Legislation not enacted by the end of a Congress is cleared from the books.
How to cite this information.
We recommend the following MLA-formatted citation when using the information you see here in academic work:
Civic Impulse. (2017). H.R. 4999 — 109th Congress: Chemical Facility Anti-Terrorism Act of 2006. Retrieved from https://www.govtrack.us/congress/bills/109/hr4999
“H.R. 4999 — 109th Congress: Chemical Facility Anti-Terrorism Act of 2006.” www.GovTrack.us. 2006. September 23, 2017 <https://www.govtrack.us/congress/bills/109/hr4999>
|title=H.R. 4999 (109th)
|accessdate=September 23, 2017
|author=109th Congress (2006)
|date=March 16, 2006
|quote=Chemical Facility Anti-Terrorism Act of 2006
Where is this information from?
GovTrack automatically collects legislative information from a variety of governmental and non-governmental sources. This page is sourced primarily from Congress.gov, the official portal of the United States Congress. Congress.gov is generally updated one day after events occur, and so legislative activity shown here may be one day behind. Data via the congress project.